Chapter 20: Problem 26
Thallium and indium form \(+1\) and \(+3\) oxidation states when in compounds. Predict the formulas of the possible compounds between thallium and oxygen and between indium and chlorine. Name the compounds.
Chapter 20: Problem 26
Thallium and indium form \(+1\) and \(+3\) oxidation states when in compounds. Predict the formulas of the possible compounds between thallium and oxygen and between indium and chlorine. Name the compounds.
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Get started for freeWhile selenic acid has the formula \(\mathrm{H}_{2} \mathrm{SeO}_{4}\) and thus is directly related to sulfuric acid, telluric acid is best visualized as \(\mathrm{H}_{6} \mathrm{TeO}_{6}\) or \(\mathrm{Te}(\mathrm{OH})_{6}\) a. What is the oxidation state of tellurium in \(\mathrm{Te}(\mathrm{OH})_{6}\) ? b. Despite its structural differences with sulfuric and selenic acid, telluric acid is a diprotic acid with \(\mathrm{p} K_{\mathrm{a}_{1}}=7.68\) and \(\mathrm{P} K_{a_{2}}=11.29 .\) Telluric acid can be prepared by hydrolysis of tellurium hexafluoride according to the equation $$ \mathrm{TeF}_{6}(g)+6 \mathrm{H}_{2} \mathrm{O}(l) \longrightarrow \mathrm{Te}(\mathrm{OH})_{6}(a q)+6 \mathrm{HF}(a q) $$ Tellurium hexafluoride can be prepared by the reaction of elemental tellurium with fluorine gas: $$ \mathrm{Te}(s)+3 \mathrm{~F}_{2}(g) \longrightarrow \mathrm{TeF}_{6}(g) $$ If a cubic block of tellurium (density \(\left.=6.240 \mathrm{~g} / \mathrm{cm}^{3}\right)\) measuring \(0.545 \mathrm{~cm}\) on edge is allowed to react with \(2.34 \mathrm{~L}\) fluorine gas at \(1.06 \mathrm{~atm}\) and \(25^{\circ} \mathrm{C}\), what is the \(\mathrm{pH}\) of a solution of \(\mathrm{Te}(\mathrm{OH})_{6}\) formed by dissolving the isolated \(\mathrm{TeF}_{6}(g)\) in \(115 \mathrm{~mL}\) solution? Assume \(100 \%\) yield in all reactions.
Halogens form a variety of covalent compounds with each other. For example, chlorine and fluorine form the compounds CIF, \(\mathrm{ClF}_{3}\), and \(\mathrm{ClF}_{5}\). Predict the molecular structure (including bond angles) for each of these three compounds. Would you expect \(\mathrm{FCl}_{3}\) to be a stable compound? Explain.
Write equations describing the reactions of Ga with each of the following: \(\mathrm{F}_{2}, \mathrm{O}_{2}, \mathrm{~S}\), and \(\mathrm{HCl}\).
Which of following statement(s) is/are true? a. Phosphoric acid is a stronger acid than nitric acid. b. The noble gas with the lowest boiling point is helium. c. Sulfur is found as the free element in the earth's crust. d. One of the atoms in Teflon is fluorine. e. The \(\mathrm{P}_{4}\) molecule has a square planar structure.
Discuss the importance of the \(\mathrm{C}-\mathrm{C}\) and \(\mathrm{Si}-\mathrm{Si}\) bond strengths and of \(\pi\) bonding to the properties of carbon and silicon.
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