Chapter 5: Problem 43
Antimony atoms are to be diffused into a silicon wafer using both predeposition and drive-in heat treatments; the background concentration of \(\mathrm{Sb}\). in this silicon material is known to be \(2 \times 10^{20}\) atoms/m^3. The predeposition treatment is to be conducted at \(900^{\circ} \mathrm{C}\) for \(1 \mathrm{~h}\); the surface concentration of \(\mathrm{Sb}\) is to be maintained at a constant level of \(8.0 \times 10^{25}\) atoms \(/ \mathrm{m}^{3}\). Drive-in diffusion will be carried out at \(1200^{\circ} \mathrm{C}\) for a period of \(1.75 \mathrm{~h}\). For the diffusion of \(\mathrm{Sb}\) in Si, values of \(Q_{d}\) and \(D_{0}\) are \(3.65 \mathrm{eV} /\) atom and \(2.14 \times 10^{-5} \mathrm{~m}^{2} / \mathrm{s}\), respectively. (a) Calculate the value of \(Q_{0}\) - (b) Determine the value of \(x_{j}\) for the drive-in diffusion treatment. (c) Also, for the drive-in treatment, compute the position \(x\) at which the concentration of \(S b\) atoms is \(5 \times 10^{23}\) atoms/m \(^{3}\)
Short Answer
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Key Concepts
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